These structures are typically designed to try and eliminate vibration within the structure to accommodate the sensitive equipment that will be eventually installed by the end user. These criteria can only be achieved by thickening the slab, using waffle slabs, pan slabs or a combination of the three. The bay widths of the supporting vertical element are decreased to also help reduce vibration as well as support the additional load requirements.
Semi-conductor Fabrication Facilities are generally designed using two-way waffle slabs with a bay spacing of approximately 20’ to 30’. The shear wall quantity is notably increased to accommodate the increased dead load and designed live loads of the thicker slabs as well as assist in vibration reduction. The floor to floor height in these type of buildings is high than typical structures to facilitate the large equipment that will occupy the finished space.
Clean Room Facilities are very similar to Semi-conductor Fabrication Facilities, except for one additional feature, the overall slab thickness is greater and a large amount of the waffle conditions are completely open to accommodate the filter systems utilized in this type of building.
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